An investigation of phase transformation behavior in sputter-deposited PtMn thin films

  • C. X. Ji
  • , Peter F. Ladwig
  • , Ronald D. Ott
  • , Y. Yang
  • , Joshua J. Yang
  • , Y. Austin Chang
  • , Eric S. Linville
  • , Jenny Gao
  • , Bharat B. Pant

    Research output: Contribution to journalArticlepeer-review

    7 Scopus citations

    Abstract

    Sputter-deposited, equiatomic PtMn thin films have application in giant magnetoresistive spin valves, tunneling magnetoresistive spin valves, and magnetic random access memory. However, the as-deposited films are found to be a disordered A1 phase in a paramagnetic state rather than an antiferromagnetic phase with L10 ostructure, which is needed for device operation. Therefore, a post-annealing step is required to induce the phase transformation from the as-deposited A1 face-centered-cubic phase to the antiferromagnetic L10 phase. The A1 to L10 metastable transformation was studied by x-ray diffraction and differential-scanning calorimetry. An exothermic transformation enthalpy of -12.1 kJ/mol of atoms was determined. The transformation kinetics were simulated using the Johnson-Mehl-Avrami analysis.

    Original languageEnglish
    Pages (from-to)50-54
    Number of pages5
    JournalJOM
    Volume58
    Issue number6
    DOIs
    StatePublished - Jun 2006

    Funding

    The authors appreciate financial sup port from the Division of Materials Sciences, Office of Basic Energy Research of the Department of Energy through grant no. DE-FG02-99ER45777, the Wisconsin Distinguished Professorship, and Seagate Technology. A portion of this research was sponsored by the Laboratory Directed Research and Development Program of Oak Ridge National Laboratory, managed by UT-Battelle, LLC for the U.S. Department of Energy under Contract No. DE-AC05-00OR22725.

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