An investigation of phase transformation behavior in sputter-deposited PtMn thin films

C. X. Ji, Peter F. Ladwig, Ronald D. Ott, Y. Yang, Joshua J. Yang, Y. Austin Chang, Eric S. Linville, Jenny Gao, Bharat B. Pant

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

Sputter-deposited, equiatomic PtMn thin films have application in giant magnetoresistive spin valves, tunneling magnetoresistive spin valves, and magnetic random access memory. However, the as-deposited films are found to be a disordered A1 phase in a paramagnetic state rather than an antiferromagnetic phase with L10 ostructure, which is needed for device operation. Therefore, a post-annealing step is required to induce the phase transformation from the as-deposited A1 face-centered-cubic phase to the antiferromagnetic L10 phase. The A1 to L10 metastable transformation was studied by x-ray diffraction and differential-scanning calorimetry. An exothermic transformation enthalpy of -12.1 kJ/mol of atoms was determined. The transformation kinetics were simulated using the Johnson-Mehl-Avrami analysis.

Original languageEnglish
Pages (from-to)50-54
Number of pages5
JournalJOM
Volume58
Issue number6
DOIs
StatePublished - Jun 2006

Funding

The authors appreciate financial sup port from the Division of Materials Sciences, Office of Basic Energy Research of the Department of Energy through grant no. DE-FG02-99ER45777, the Wisconsin Distinguished Professorship, and Seagate Technology. A portion of this research was sponsored by the Laboratory Directed Research and Development Program of Oak Ridge National Laboratory, managed by UT-Battelle, LLC for the U.S. Department of Energy under Contract No. DE-AC05-00OR22725.

FundersFunder number
Division of Materials Sciences
U.S. Department of EnergyDE-AC05-00OR22725, DE-FG02-99ER45777
Oak Ridge National Laboratory
UT-Battelle
Seagate Technology

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