An improved continuous compositional-spread technique based on pulsed-laser deposition and applicable to large substrate areas

H. M. Christen; C. M. Rouleau; I. Ohkubo; H. Y. Zhai; H. N. Lee; S. Sathyamurthy; D. H. Lowndes

doi:10.1063/1.1602962

An improved continuous compositional-spread technique based on pulsed-laser deposition and applicable to large substrate areas

H. M. Christen, C. M. Rouleau, I. Ohkubo, H. Y. Zhai, H. N. Lee, S. Sathyamurthy, D. H. Lowndes

Oak Ridge National Laboratory

Research output: Contribution to journal › Review article › peer-review

52 Scopus citations

Abstract

A continuous compositional-spread (CCS) approach for thin-film fabrication based on pulsed-laser deposition (PLD) was presented. The procedure was used to fabricate binary composition-spread films of (Sr_1-xCa _x)RuO₃. A study of the structure and properties of the composition-spread films indicated that the approach yielded high-quality films.

Original language	English
Pages (from-to)	4058-4062
Number of pages	5
Journal	Review of Scientific Instruments
Volume	74
Issue number	9
DOIs	https://doi.org/10.1063/1.1602962
State	Published - Sep 2003

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10.1063/1.1602962

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abstract = "A continuous compositional-spread (CCS) approach for thin-film fabrication based on pulsed-laser deposition (PLD) was presented. The procedure was used to fabricate binary composition-spread films of (Sr1-xCa x)RuO3. A study of the structure and properties of the composition-spread films indicated that the approach yielded high-quality films.",

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AU - Ohkubo, I.

AU - Zhai, H. Y.

AU - Lee, H. N.

AU - Sathyamurthy, S.

AU - Lowndes, D. H.

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AB - A continuous compositional-spread (CCS) approach for thin-film fabrication based on pulsed-laser deposition (PLD) was presented. The procedure was used to fabricate binary composition-spread films of (Sr1-xCa x)RuO3. A study of the structure and properties of the composition-spread films indicated that the approach yielded high-quality films.

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An improved continuous compositional-spread technique based on pulsed-laser deposition and applicable to large substrate areas

Abstract

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