Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties

Loïc Baggetto; Cédric Charvillat; Yannick Thébault; Jérôme Esvan; Marie Christine Lafont; Emmanuel Scheid; Gabriel M. Veith; Constantin Vahlas

doi:10.1002/pssa.201532838

Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties

Loïc Baggetto, Cédric Charvillat, Yannick Thébault, Jérôme Esvan, Marie Christine Lafont, Emmanuel Scheid, Gabriel M. Veith, Constantin Vahlas

Energy Storage & Conversion

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Abstract

Ti/Al₂O₃ bilayer stacks are used as model systems to investigate the role of atomic layer deposition (ALD) and chemical vapor deposition (CVD) to prepare 30-180 nm thick amorphous alumina films as protective barriers for the medium temperature oxidation (500-600°C) of titanium, which is employed in aeronautic applications. X-ray diffraction (XRD), transmission electron microscopy (TEM) with selected area electron diffraction (SAED), and X-ray photoelectron spectroscopy (XPS) results show that the films produced from the direct liquid injection (DLI) CVD of aluminum tri-isopropoxide (ATI) are poor oxygen barriers. The films processed using the ALD of trimethylaluminum (TMA) show good barrier properties but an extensive intermixing with Ti which subsequently oxidizes. In contrast, the films prepared from dimethyl aluminum isopropoxide (DMAI) by CVD are excellent oxygen barriers and show little intermixing with Ti. Overall, these measurements correlate the effect of the alumina coating thickness, morphology, and stoichiometry resulting from the preparation method to the oxidation barrier properties, and show that compact and stoichiometric amorphous alumina films offer superior barrier properties.

Original language	English
Pages (from-to)	470-480
Number of pages	11
Journal	Physica Status Solidi (A) Applications and Materials Science
Volume	213
Issue number	2
DOIs	https://doi.org/10.1002/pssa.201532838
State	Published - Feb 1 2016

Funding

This work was financially supported by the STAE-RTRA foundation (Toulouse, France) under the RTRA-STAE/2014/P/VIMA/12 project grant. The U.S. Department of Energy (DOE), Basic Energy Sciences (BES), Materials Sciences and Engineering Division supported a portion of this work (G.M.V., Ti thin film preparation).

Funders	Funder number
STAE-RTRA foundation (Toulouse, France)	RTRA-STAE/2014/P/VIMA/12
U.S. Department of Energy
Basic Energy Sciences

Keywords

Ti/AlO
X-ray photoelectron spectroscopy
deposition
interdiffusion
oxygen barriers
thin films

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title = "Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties",

abstract = "Ti/Al2O3 bilayer stacks are used as model systems to investigate the role of atomic layer deposition (ALD) and chemical vapor deposition (CVD) to prepare 30-180 nm thick amorphous alumina films as protective barriers for the medium temperature oxidation (500-600°C) of titanium, which is employed in aeronautic applications. X-ray diffraction (XRD), transmission electron microscopy (TEM) with selected area electron diffraction (SAED), and X-ray photoelectron spectroscopy (XPS) results show that the films produced from the direct liquid injection (DLI) CVD of aluminum tri-isopropoxide (ATI) are poor oxygen barriers. The films processed using the ALD of trimethylaluminum (TMA) show good barrier properties but an extensive intermixing with Ti which subsequently oxidizes. In contrast, the films prepared from dimethyl aluminum isopropoxide (DMAI) by CVD are excellent oxygen barriers and show little intermixing with Ti. Overall, these measurements correlate the effect of the alumina coating thickness, morphology, and stoichiometry resulting from the preparation method to the oxidation barrier properties, and show that compact and stoichiometric amorphous alumina films offer superior barrier properties.",

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T2 - Interfacial chemistry and thermal oxidation barrier properties

AU - Baggetto, Loïc

AU - Charvillat, Cédric

AU - Thébault, Yannick

AU - Esvan, Jérôme

AU - Lafont, Marie Christine

AU - Scheid, Emmanuel

AU - Veith, Gabriel M.

AU - Vahlas, Constantin

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N2 - Ti/Al2O3 bilayer stacks are used as model systems to investigate the role of atomic layer deposition (ALD) and chemical vapor deposition (CVD) to prepare 30-180 nm thick amorphous alumina films as protective barriers for the medium temperature oxidation (500-600°C) of titanium, which is employed in aeronautic applications. X-ray diffraction (XRD), transmission electron microscopy (TEM) with selected area electron diffraction (SAED), and X-ray photoelectron spectroscopy (XPS) results show that the films produced from the direct liquid injection (DLI) CVD of aluminum tri-isopropoxide (ATI) are poor oxygen barriers. The films processed using the ALD of trimethylaluminum (TMA) show good barrier properties but an extensive intermixing with Ti which subsequently oxidizes. In contrast, the films prepared from dimethyl aluminum isopropoxide (DMAI) by CVD are excellent oxygen barriers and show little intermixing with Ti. Overall, these measurements correlate the effect of the alumina coating thickness, morphology, and stoichiometry resulting from the preparation method to the oxidation barrier properties, and show that compact and stoichiometric amorphous alumina films offer superior barrier properties.

AB - Ti/Al2O3 bilayer stacks are used as model systems to investigate the role of atomic layer deposition (ALD) and chemical vapor deposition (CVD) to prepare 30-180 nm thick amorphous alumina films as protective barriers for the medium temperature oxidation (500-600°C) of titanium, which is employed in aeronautic applications. X-ray diffraction (XRD), transmission electron microscopy (TEM) with selected area electron diffraction (SAED), and X-ray photoelectron spectroscopy (XPS) results show that the films produced from the direct liquid injection (DLI) CVD of aluminum tri-isopropoxide (ATI) are poor oxygen barriers. The films processed using the ALD of trimethylaluminum (TMA) show good barrier properties but an extensive intermixing with Ti which subsequently oxidizes. In contrast, the films prepared from dimethyl aluminum isopropoxide (DMAI) by CVD are excellent oxygen barriers and show little intermixing with Ti. Overall, these measurements correlate the effect of the alumina coating thickness, morphology, and stoichiometry resulting from the preparation method to the oxidation barrier properties, and show that compact and stoichiometric amorphous alumina films offer superior barrier properties.

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Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties

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