Activation Energies for Oxide- and Interface-Trap Charge Generation Due to Negative-Bias Temperature Stress of Si-Capped SiGe-pMOSFETs

  • Guo Xing Duan
  • , Jordan Hatchtel
  • , Xiao Shen
  • , En Xia Zhang
  • , Cher Xuan Zhang
  • , Blair R. Tuttle
  • , Daniel M. Fleetwood
  • , Ronald D. Schrimpf
  • , Robert A. Reed
  • , Jacopo Franco
  • , Dimitri Linten
  • , Jerome Mitard
  • , Liesbeth Witters
  • , Nadine Collaert
  • , Matthew F. Chisholm
  • , Sokrates T. Pantelides

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

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