Abstract
A method to describe the thickness of a film by studying the growth of Pb on Si (111) substrates. Investigations show that the deposition at low temperature on a Si substrate lead to the atomically uniform Pb films. It was found that the Pb films exhibited large monolayer-by-monolayer variations in electronic structure. The data collected illustrated that the initial surface structure could be a deciding factor for the morphological development of films.
| Original language | English |
|---|---|
| Pages (from-to) | 1235-1237 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 85 |
| Issue number | 7 |
| DOIs | |
| State | Published - Aug 16 2004 |
Funding
This work is supported by the U.S. National Science Foundation (Grant No. DMR-02-03003). The authors acknowledge the Petroleum Research Fund, administered by the American Chemical Society, and the U.S. Department of Energy, Division of Materials Sciences (Grant No. DEFG02-91ER45439), for partial support of the synchrotron beamline operation and the central facilities of the Frederick Seitz Materials Research Laboratory. The Synchrotron Radiation Center is supported by the U. S. National Science Foundation (Grant No. DMR-00-84402).
| Funders | Funder number |
|---|---|
| Division of Materials Sciences | DEFG02-91ER45439 |
| National Science Foundation | DMR-00-84402, DMR-02-03003 |
| National Science Foundation | |
| U.S. Department of Energy | |
| American Chemical Society | |
| American Chemical Society Petroleum Research Fund |