A survey of semiconductor data management systems technology

KW Tobin, TP Karnowski, F Lakhani

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Original languageAmerican English
Title of host publicationMetrology, Inspection, And Process Control For Microlithography Xiv
EditorsNT Sullivan
Pages248-257
Number of pages10
StatePublished - 2000

Keywords

  • Automatic defect classification
  • Data management system
  • Database
  • Datamining
  • Industry survey
  • Knowledge discovery
  • Spatial signature analysis
  • Statistical process control
  • Yield management

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