A novel backside gate structure to improve device performance

Y. H. Hwang, Weidi Zhu, Chen Dong, Shihyun Ahn, Fan Ren, Ivan I. Kravchenko, David J. Smith, Stephen J. Pearton

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A novel structure with backside gate was proposed in this study. The effect of backside gate to the device performance including DC performance and breakdown voltage was investigated. When the back-side gate was biased at -25V, the leakage current could be suppressed to one order lower. As a result, the subthreshold swing (SS) could be improved from 240 to 137 mV/dec. Most important of all, the off-state drain breakdown voltage could be increased by 40%.

Original languageEnglish
Title of host publicationWide Bandgap Semiconductor Materials and Devices 16
EditorsS. Jang, K. Shenai, G. W. Hunter, F. Ren, C. O'Dwyer, K. C. Mishra
PublisherElectrochemical Society Inc.
Pages185-190
Number of pages6
Edition1
ISBN (Electronic)9781607685913
DOIs
StatePublished - 2015
EventSymposium on Wide Bandgap Semiconductor Materials and Devices 16 - 227th ECS Meeting - Chicago, United States
Duration: May 24 2015May 28 2015

Publication series

NameECS Transactions
Number1
Volume66
ISSN (Print)1938-6737
ISSN (Electronic)1938-5862

Conference

ConferenceSymposium on Wide Bandgap Semiconductor Materials and Devices 16 - 227th ECS Meeting
Country/TerritoryUnited States
CityChicago
Period05/24/1505/28/15

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