Abstract
A plasma spectrometer design based on advances in lithography and microchip stacking technologies is described. A series of curved plate energy analyzers, with an integrated collimator, is etched into a silicon wafer. Tests of spectrometer elements, the energy analyzer and collimator, were performed with a 5 keV electron beam. The measured collimator transmission and energy selectivity were in good agreement with design targets. A single wafer element could be used as a plasma processing or fusion first wall diagnostic.
| Original language | English |
|---|---|
| Article number | 11D302 |
| Journal | Review of Scientific Instruments |
| Volume | 87 |
| Issue number | 11 |
| DOIs | |
| State | Published - Nov 1 2016 |
| Externally published | Yes |
Funding
This work was supported by NASA Award NNX14AJ36G and Department of Energy Award DE-SC0013841.
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