Abstract
A plasma spectrometer design based on advances in lithography and microchip stacking technologies is described. A series of curved plate energy analyzers, with an integrated collimator, is etched into a silicon wafer. Tests of spectrometer elements, the energy analyzer and collimator, were performed with a 5 keV electron beam. The measured collimator transmission and energy selectivity were in good agreement with design targets. A single wafer element could be used as a plasma processing or fusion first wall diagnostic.
Original language | English |
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Article number | 11D302 |
Journal | Review of Scientific Instruments |
Volume | 87 |
Issue number | 11 |
DOIs | |
State | Published - Nov 1 2016 |
Externally published | Yes |
Funding
This work was supported by NASA Award NNX14AJ36G and Department of Energy Award DE-SC0013841.
Funders | Funder number |
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U.S. Department of Energy | DE-SC0013841 |
National Aeronautics and Space Administration | NNX14AJ36G |