A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes

Jitendra Menda; Lakshman Kumar Vanga; Benjamin Ulmen; Yoke Khin Yap; Pan Zhengwei; Ilia N. Ivanov; Alex A. Puretzky; David B. Geohegan

doi:10.1557/proc-858-hh3.11

A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes

Jitendra Menda, Lakshman Kumar Vanga, Benjamin Ulmen, Yoke Khin Yap, Pan Zhengwei, Ilia N. Ivanov, Alex A. Puretzky, David B. Geohegan

Functional Hybrid Nanomaterials

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

Plasma enhanced chemical vapor deposition (PECVD) is a unique technique for growing vertically-aligned multiwall carbon nanotubes (VA-MWNTs) at controllable tube densities. This technique is of considerable importance for low temperature growth of VA-MWNTs at desired locations. However, the graphitic order of these MWNTs is inferior to those grown by laser ablation, arc discharge, and thermal CVD techniques. Previously, these VA-MWNTs were grown by a one-plasma approach (DC, microwave etc), either for gas decomposition or substrate biasing. Here, we describe a dual-RF plasma enhanced CVD (dual-RF-PECVD) technique that offers unique capability for controlling the graphitic order and diameters of VA-MWNTs.

Original language	English
Title of host publication	Functional Carbon Nanotubes
Publisher	Materials Research Society
Pages	69-75
Number of pages	7
ISBN (Print)	1558998101, 9781558998100
DOIs	https://doi.org/10.1557/proc-858-hh3.11
State	Published - 2004
Event	2004 MRS Fall Meeting - Boston, MA, United States Duration: Nov 29 2004 → Dec 3 2004

Publication series

Name	Materials Research Society Symposium Proceedings
Volume	858
ISSN (Print)	0272-9172

Conference

Conference	2004 MRS Fall Meeting
Country/Territory	United States
City	Boston, MA
Period	11/29/04 → 12/3/04

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10.1557/proc-858-hh3.11

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Menda, J., Kumar Vanga, L., Ulmen, B., Yap, Y. K., Zhengwei, P., Ivanov, I. N., Puretzky, A. A., & Geohegan, D. B. (2004). A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes. In Functional Carbon Nanotubes (pp. 69-75). (Materials Research Society Symposium Proceedings; Vol. 858). Materials Research Society. https://doi.org/10.1557/proc-858-hh3.11

@inproceedings{68bfac3a10ea47109acdc872b2c49cea,

title = "A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes",

abstract = "Plasma enhanced chemical vapor deposition (PECVD) is a unique technique for growing vertically-aligned multiwall carbon nanotubes (VA-MWNTs) at controllable tube densities. This technique is of considerable importance for low temperature growth of VA-MWNTs at desired locations. However, the graphitic order of these MWNTs is inferior to those grown by laser ablation, arc discharge, and thermal CVD techniques. Previously, these VA-MWNTs were grown by a one-plasma approach (DC, microwave etc), either for gas decomposition or substrate biasing. Here, we describe a dual-RF plasma enhanced CVD (dual-RF-PECVD) technique that offers unique capability for controlling the graphitic order and diameters of VA-MWNTs.",

author = "Jitendra Menda and {Kumar Vanga}, Lakshman and Benjamin Ulmen and Yap, {Yoke Khin} and Pan Zhengwei and Ivanov, {Ilia N.} and Puretzky, {Alex A.} and Geohegan, {David B.}",

year = "2004",

doi = "10.1557/proc-858-hh3.11",

language = "English",

isbn = "1558998101",

series = "Materials Research Society Symposium Proceedings",

publisher = "Materials Research Society",

pages = "69--75",

booktitle = "Functional Carbon Nanotubes",

note = "2004 MRS Fall Meeting ; Conference date: 29-11-2004 Through 03-12-2004",

}

Menda, J, Kumar Vanga, L, Ulmen, B, Yap, YK, Zhengwei, P, Ivanov, IN, Puretzky, AA & Geohegan, DB 2004, A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes. in Functional Carbon Nanotubes. Materials Research Society Symposium Proceedings, vol. 858, Materials Research Society, pp. 69-75, 2004 MRS Fall Meeting, Boston, MA, United States, 11/29/04. https://doi.org/10.1557/proc-858-hh3.11

A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes. / Menda, Jitendra; Kumar Vanga, Lakshman; Ulmen, Benjamin et al.
Functional Carbon Nanotubes. Materials Research Society, 2004. p. 69-75 (Materials Research Society Symposium Proceedings; Vol. 858).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes

AU - Menda, Jitendra

AU - Kumar Vanga, Lakshman

AU - Ulmen, Benjamin

AU - Yap, Yoke Khin

AU - Zhengwei, Pan

AU - Ivanov, Ilia N.

AU - Puretzky, Alex A.

AU - Geohegan, David B.

PY - 2004

Y1 - 2004

N2 - Plasma enhanced chemical vapor deposition (PECVD) is a unique technique for growing vertically-aligned multiwall carbon nanotubes (VA-MWNTs) at controllable tube densities. This technique is of considerable importance for low temperature growth of VA-MWNTs at desired locations. However, the graphitic order of these MWNTs is inferior to those grown by laser ablation, arc discharge, and thermal CVD techniques. Previously, these VA-MWNTs were grown by a one-plasma approach (DC, microwave etc), either for gas decomposition or substrate biasing. Here, we describe a dual-RF plasma enhanced CVD (dual-RF-PECVD) technique that offers unique capability for controlling the graphitic order and diameters of VA-MWNTs.

AB - Plasma enhanced chemical vapor deposition (PECVD) is a unique technique for growing vertically-aligned multiwall carbon nanotubes (VA-MWNTs) at controllable tube densities. This technique is of considerable importance for low temperature growth of VA-MWNTs at desired locations. However, the graphitic order of these MWNTs is inferior to those grown by laser ablation, arc discharge, and thermal CVD techniques. Previously, these VA-MWNTs were grown by a one-plasma approach (DC, microwave etc), either for gas decomposition or substrate biasing. Here, we describe a dual-RF plasma enhanced CVD (dual-RF-PECVD) technique that offers unique capability for controlling the graphitic order and diameters of VA-MWNTs.

UR - http://www.scopus.com/inward/record.url?scp=34249940753&partnerID=8YFLogxK

U2 - 10.1557/proc-858-hh3.11

DO - 10.1557/proc-858-hh3.11

M3 - Conference contribution

AN - SCOPUS:34249940753

SN - 1558998101

SN - 9781558998100

T3 - Materials Research Society Symposium Proceedings

SP - 69

EP - 75

BT - Functional Carbon Nanotubes

PB - Materials Research Society

T2 - 2004 MRS Fall Meeting

Y2 - 29 November 2004 through 3 December 2004

ER -

A dual-RF-plasma approach for controlling the graphitic order and diameters of vertically-aligned multiwall carbon nanotubes

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