7.4: Dose control circuits for digitally addressable VACNF based maskless lithography

Sazia A. Eliza; Syed K. Islam; Touhidur Rahman; Nora D. Bull; Benjamin J. Blalock; Larry R. Baylor; Milton N. Ericson; Walter L. Gardner

doi:10.1109/IVNC.2010.5563200

7.4: Dose control circuits for digitally addressable VACNF based maskless lithography

Sazia A. Eliza
, Syed K. Islam
, Touhidur Rahman
, Nora D. Bull
, Benjamin J. Blalock
, Larry R. Baylor
, Milton N. Ericson
, Walter L. Gardner

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

This paper presents dose control electronics and a digital addressing method for the vertically aligned carbon nanofiber (VACNF) based massively parallel maskless e-beam lithography system. The Digital Electrostatically focused e-beam Array direct-write Lithography (DEAL) developed by our research group in Oak Ridge National Laboratory [1] incorporates digitally addressable field emission arrays (DAFEAs) of the VACNFs which function as the lithography heads during the exposure of the resist. A logic and memory control circuit (LMC) and a dose control circuit (DCC) have been designed to write a desired pattern and control the dose of electrons, respectively. This paper summarizes our previous works on different versions of the DCCs [2- 4] designed and optimized in the effort of obtaining a fixed and optimum dosage with the smaller circuit area.

Original language	English
Title of host publication	23rd International Vacuum Nanoelectronics Conference, IVNC 2010
Pages	109-110
Number of pages	2
DOIs	https://doi.org/10.1109/IVNC.2010.5563200
State	Published - 2010
Event	23rd International Vacuum Nanoelectronics Conference, IVNC 2010 - Palo Alto, CA, United States Duration: Jul 26 2010 → Jul 30 2010

Publication series

Name	23rd International Vacuum Nanoelectronics Conference, IVNC 2010

Conference

Conference	23rd International Vacuum Nanoelectronics Conference, IVNC 2010
Country/Territory	United States
City	Palo Alto, CA
Period	07/26/10 → 07/30/10

Keywords

Dose control circuit
Maskess lithography
Vertically aligned carbon nanofiber

Access to Document

10.1109/IVNC.2010.5563200

Cite this

Eliza, S. A., Islam, S. K., Rahman, T., Bull, N. D., Blalock, B. J., Baylor, L. R., Ericson, M. N., & Gardner, W. L. (2010). 7.4: Dose control circuits for digitally addressable VACNF based maskless lithography. In 23rd International Vacuum Nanoelectronics Conference, IVNC 2010 (pp. 109-110). Article 5563200 (23rd International Vacuum Nanoelectronics Conference, IVNC 2010). https://doi.org/10.1109/IVNC.2010.5563200

@inproceedings{6159b2cafea741f49e8967597ad6d735,

title = "7.4: Dose control circuits for digitally addressable VACNF based maskless lithography",

abstract = "This paper presents dose control electronics and a digital addressing method for the vertically aligned carbon nanofiber (VACNF) based massively parallel maskless e-beam lithography system. The Digital Electrostatically focused e-beam Array direct-write Lithography (DEAL) developed by our research group in Oak Ridge National Laboratory [1] incorporates digitally addressable field emission arrays (DAFEAs) of the VACNFs which function as the lithography heads during the exposure of the resist. A logic and memory control circuit (LMC) and a dose control circuit (DCC) have been designed to write a desired pattern and control the dose of electrons, respectively. This paper summarizes our previous works on different versions of the DCCs [2- 4] designed and optimized in the effort of obtaining a fixed and optimum dosage with the smaller circuit area.",

keywords = "Dose control circuit, Maskess lithography, Vertically aligned carbon nanofiber",

author = "Eliza, \{Sazia A.\} and Islam, \{Syed K.\} and Touhidur Rahman and Bull, \{Nora D.\} and Blalock, \{Benjamin J.\} and Baylor, \{Larry R.\} and Ericson, \{Milton N.\} and Gardner, \{Walter L.\}",

year = "2010",

doi = "10.1109/IVNC.2010.5563200",

language = "English",

isbn = "9781424478873",

series = "23rd International Vacuum Nanoelectronics Conference, IVNC 2010",

pages = "109--110",

booktitle = "23rd International Vacuum Nanoelectronics Conference, IVNC 2010",

note = "23rd International Vacuum Nanoelectronics Conference, IVNC 2010 ; Conference date: 26-07-2010 Through 30-07-2010",

}

Eliza, SA, Islam, SK, Rahman, T, Bull, ND, Blalock, BJ, Baylor, LR , Ericson, MN & Gardner, WL 2010, 7.4: Dose control circuits for digitally addressable VACNF based maskless lithography. in 23rd International Vacuum Nanoelectronics Conference, IVNC 2010., 5563200, 23rd International Vacuum Nanoelectronics Conference, IVNC 2010, pp. 109-110, 23rd International Vacuum Nanoelectronics Conference, IVNC 2010, Palo Alto, CA, United States, 07/26/10. https://doi.org/10.1109/IVNC.2010.5563200

7.4: Dose control circuits for digitally addressable VACNF based maskless lithography. / Eliza, Sazia A.; Islam, Syed K.; Rahman, Touhidur et al.
23rd International Vacuum Nanoelectronics Conference, IVNC 2010. 2010. p. 109-110 5563200 (23rd International Vacuum Nanoelectronics Conference, IVNC 2010).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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AU - Eliza, Sazia A.

AU - Islam, Syed K.

AU - Rahman, Touhidur

AU - Bull, Nora D.

AU - Blalock, Benjamin J.

AU - Baylor, Larry R.

AU - Ericson, Milton N.

AU - Gardner, Walter L.

PY - 2010

Y1 - 2010

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AB - This paper presents dose control electronics and a digital addressing method for the vertically aligned carbon nanofiber (VACNF) based massively parallel maskless e-beam lithography system. The Digital Electrostatically focused e-beam Array direct-write Lithography (DEAL) developed by our research group in Oak Ridge National Laboratory [1] incorporates digitally addressable field emission arrays (DAFEAs) of the VACNFs which function as the lithography heads during the exposure of the resist. A logic and memory control circuit (LMC) and a dose control circuit (DCC) have been designed to write a desired pattern and control the dose of electrons, respectively. This paper summarizes our previous works on different versions of the DCCs [2- 4] designed and optimized in the effort of obtaining a fixed and optimum dosage with the smaller circuit area.

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ER -

7.4: Dose control circuits for digitally addressable VACNF based maskless lithography

Abstract

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Keywords

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