7.4: Dose control circuits for digitally addressable VACNF based maskless lithography

Sazia A. Eliza; Syed K. Islam; Touhidur Rahman; Nora D. Bull; Benjamin J. Blalock; Larry R. Baylor; Milton N. Ericson; Walter L. Gardner

doi:10.1109/IVNC.2010.5563200

7.4: Dose control circuits for digitally addressable VACNF based maskless lithography

Sazia A. Eliza, Syed K. Islam, Touhidur Rahman, Nora D. Bull, Benjamin J. Blalock, Larry R. Baylor, Milton N. Ericson, Walter L. Gardner

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

This paper presents dose control electronics and a digital addressing method for the vertically aligned carbon nanofiber (VACNF) based massively parallel maskless e-beam lithography system. The Digital Electrostatically focused e-beam Array direct-write Lithography (DEAL) developed by our research group in Oak Ridge National Laboratory [1] incorporates digitally addressable field emission arrays (DAFEAs) of the VACNFs which function as the lithography heads during the exposure of the resist. A logic and memory control circuit (LMC) and a dose control circuit (DCC) have been designed to write a desired pattern and control the dose of electrons, respectively. This paper summarizes our previous works on different versions of the DCCs [2- 4] designed and optimized in the effort of obtaining a fixed and optimum dosage with the smaller circuit area.

Original language	English
Title of host publication	23rd International Vacuum Nanoelectronics Conference, IVNC 2010
Pages	109-110
Number of pages	2
DOIs	https://doi.org/10.1109/IVNC.2010.5563200
State	Published - 2010
Event	23rd International Vacuum Nanoelectronics Conference, IVNC 2010 - Palo Alto, CA, United States Duration: Jul 26 2010 → Jul 30 2010

Publication series

Name	23rd International Vacuum Nanoelectronics Conference, IVNC 2010

Conference

Conference	23rd International Vacuum Nanoelectronics Conference, IVNC 2010
Country/Territory	United States
City	Palo Alto, CA
Period	07/26/10 → 07/30/10

Keywords

Dose control circuit
Maskess lithography
Vertically aligned carbon nanofiber

Access to Document

10.1109/IVNC.2010.5563200

Cite this

Eliza, S. A., Islam, S. K., Rahman, T., Bull, N. D., Blalock, B. J., Baylor, L. R., Ericson, M. N., & Gardner, W. L. (2010). 7.4: Dose control circuits for digitally addressable VACNF based maskless lithography. In 23rd International Vacuum Nanoelectronics Conference, IVNC 2010 (pp. 109-110). Article 5563200 (23rd International Vacuum Nanoelectronics Conference, IVNC 2010). https://doi.org/10.1109/IVNC.2010.5563200

@inproceedings{6159b2cafea741f49e8967597ad6d735,

title = "7.4: Dose control circuits for digitally addressable VACNF based maskless lithography",

abstract = "This paper presents dose control electronics and a digital addressing method for the vertically aligned carbon nanofiber (VACNF) based massively parallel maskless e-beam lithography system. The Digital Electrostatically focused e-beam Array direct-write Lithography (DEAL) developed by our research group in Oak Ridge National Laboratory [1] incorporates digitally addressable field emission arrays (DAFEAs) of the VACNFs which function as the lithography heads during the exposure of the resist. A logic and memory control circuit (LMC) and a dose control circuit (DCC) have been designed to write a desired pattern and control the dose of electrons, respectively. This paper summarizes our previous works on different versions of the DCCs [2- 4] designed and optimized in the effort of obtaining a fixed and optimum dosage with the smaller circuit area.",

keywords = "Dose control circuit, Maskess lithography, Vertically aligned carbon nanofiber",

author = "Eliza, {Sazia A.} and Islam, {Syed K.} and Touhidur Rahman and Bull, {Nora D.} and Blalock, {Benjamin J.} and Baylor, {Larry R.} and Ericson, {Milton N.} and Gardner, {Walter L.}",

year = "2010",

doi = "10.1109/IVNC.2010.5563200",

language = "English",

isbn = "9781424478873",

series = "23rd International Vacuum Nanoelectronics Conference, IVNC 2010",

pages = "109--110",

booktitle = "23rd International Vacuum Nanoelectronics Conference, IVNC 2010",

note = "23rd International Vacuum Nanoelectronics Conference, IVNC 2010 ; Conference date: 26-07-2010 Through 30-07-2010",

}

Eliza, SA, Islam, SK, Rahman, T, Bull, ND, Blalock, BJ, Baylor, LR , Ericson, MN & Gardner, WL 2010, 7.4: Dose control circuits for digitally addressable VACNF based maskless lithography. in 23rd International Vacuum Nanoelectronics Conference, IVNC 2010., 5563200, 23rd International Vacuum Nanoelectronics Conference, IVNC 2010, pp. 109-110, 23rd International Vacuum Nanoelectronics Conference, IVNC 2010, Palo Alto, CA, United States, 07/26/10. https://doi.org/10.1109/IVNC.2010.5563200

7.4: Dose control circuits for digitally addressable VACNF based maskless lithography. / Eliza, Sazia A.; Islam, Syed K.; Rahman, Touhidur et al.
23rd International Vacuum Nanoelectronics Conference, IVNC 2010. 2010. p. 109-110 5563200 (23rd International Vacuum Nanoelectronics Conference, IVNC 2010).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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AU - Baylor, Larry R.

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AU - Gardner, Walter L.

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7.4: Dose control circuits for digitally addressable VACNF based maskless lithography

Abstract

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Keywords

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